Structural and optical characteristics determined by the sputtering deposition conditions of oxide thin films

Beilstein Journal of Nanotechnology

article

Petronela Prepelita¹  Florin Garoi¹  Valentin Craciun¹ 

[1] National Institute for Laser

关键词: magnetron sputtering;    optical quality;    SiO2 and ZnO;    structuralproperties;    thin films;   

DOI  :  10.3762/bjnano.12.29

学科分类：环境监测和分析

来源: Beilstein - Institut zur Foerderung der Chemischen Wissenschaften

【 摘 要 】

The influence of film thickness on the structural and optical properties of silicon dioxide (SiO2) and zinc oxide (ZnO) thin filmsdeposited by radio frequency magnetron sputtering on quartz substrates was investigated. The deposition conditions were optimized to achieve stoichiometric thin films. The orientation of crystallites, structure, and composition were investigated by X-raydiffraction (XRD) and X-ray photoelectron spectroscopy (XPS), while the surface topography of the samples was analyzed usingscanning electron microscopy (SEM). The optical characteristics were measured for samples with the same composition but obtained with different deposition parameters, such as increasing thickness. The optical constants (i.e., the refractive index n, theextinction coefficient k, and the absorption coefficient α) of the SiO2 and ZnO oxide films were determined from the transmissionspectra recorded in the range of 190–2500 nm by using the Swanepoel method, while the energy bandgap was calculated from theabsorption spectra. The influence of thickness on the structural and optical properties of the oxide films was investigated. Goodoptical quality and performance were noticed, which makes these thin films worthy of integration into metamaterial structures.

【 授权许可】

CC BY