期刊论文详细信息
Problemy Mechatroniki | |
The Influence of the Bias on Mechanical Properties of a-C:H CVD Thin Films | |
Mariana Kuffova1  Marián MARTON2  Łukasz KACZMAREK3  Daniel KOTTFER4  | |
[1] Academy of Armed Forces of gen. M.R. Štefánik,Department of Mechanical Engineering, Liptovský Mikulás, Slovakia;Slovak University of Technology, Bratislava, Slovak Republic, Faculty of Electrical Engineering and Information Technology;Technical University of Lodz, Poland Faculty of Mechanical Engineering;Technical University, Kosice, Slovak Republic, Faculty of Mechanical Engineering; | |
关键词: mechanics; a-C:H thin film; hardness; Young´s modulus; 7075 Al alloy; | |
DOI : 10.5604/01.3001.0011.7176 | |
来源: DOAJ |
【 摘 要 】
In this study a-C:H (hydrogenated amorphous carbon) thin films were deposited on the 7075 Al alloy without an interlayer using a DC CVD (direct current chemical vapor deposition) method with varied negative substrate bias in order to improve the hardness and Young´s modulus. The highest values of films hardness and Young´s modulus were 25.6±3.5 GPa and 140.3±4.6 GPa, respectively. The measured results show a promising potential of the a-C:H coated 7075 Al alloy for low load (up to 10 N) applications.
【 授权许可】
Unknown