Scattering Phenomena in Porous Sol-Gel-Derived Silica Films

Coatings

Paweł Karasiński¹  Piotr Dulian²  Paweł Winkowski³  Janusz Jaglarz³ 

[1] Department of Optoelectronics, Silesian University of Technology, 2, 44-100 Gliwice, Poland;Faculty of Chemical Engineering and Technology, Cracow University of Technology, 31-155 Cracow, Poland;Faculty of Materials Engineering, Cracow University of Technology, 31-155 Cracow, Poland;

关键词: sol-gel process;    thin films;    porous silica film;    antireflection coatings;    light scattering;    spectroscopic ellipsometry;   

DOI  :  10.3390/coatings10060509

来源: DOAJ

【 摘 要 】

This paper presents the results of investigations of optical scattering phenomena in porous silica films. SiO₂ films were prepared by the sol-gel method and deposited on polished silicon wafers by the dip-coating technique. Fabricated films were studied using integrating sphere reflectometry, spectroscopic ellipsometry, atomic force microscopy, scanning electron microscopy, and angular resolve scattering. The spectral characteristics of the refractive and extinction indices and scattering extinction coefficients are presented. Additionally, the depolarization of reflected beam from samples was measured. The tested films were characterized by a thickness of 500 to 900 nm, a porosity of 50%, and refractive indices of less than 1.24. The observed depolarization of light reflected from SiO₂ films resulted from surface and bulk scattering. This phenomenon resulted from the presence of surface and closed pores located in the bulk of SiO₂ film.

【 授权许可】

Unknown