Realization and Characterization of Aligned Silicon Nanowire Array With Thin Silver Film

IEEE Photonics Journal

Yen-Ting Pan¹  San-Liang Lee¹  Kai-Chung Wu¹  Yung-Jr Hung² 

[1] Department of Electronic Engineering, National Taiwan University of Science and Technology (NTUST) , Taipei, Taiwan;Department of Electronic Engineering, National Taiwan University of Science and Technology (NTUST), Taipei, Taiwan;

关键词: Engineered photonic nanostructures;    subwavelength structures;    fabrication and characterization;   

DOI  :  10.1109/JPHOT.2011.2151277

来源: DOAJ

【 摘 要 】

Wafer-scale fabrication of aligned and uniform silicon nanowire (SiNW) arrays is achieved with good controllability and reproducibility by depositing a thin silver film on a silicon surface prior to wet etching. Fast SiNW formation with a rate of 1.4 μm/min is achieved with optimized process condition, while lower etching rate enables finer SiNW formation in a small open area. Realized SiNWs are demonstrated to have good material and optical properties. With the help of aligned SiNWs, we demonstrate the fabrication of a black nonreflecting silicon surface with a surface reflectivity of around 2-4% uniformly over a 4-in wafer area. This material is expected to be promising as a building block for various applications due to its low-cost and mass-producible fabrication and excellent characteristics.

【 授权许可】

Unknown