Self-assembly of octadecyltrichlorosilane: Surface structures formed using different protocols of particle lithography

Beilstein Journal of Nanotechnology

Kathie L. Lusker¹  Wilson K. Serem¹  Zorabel M. LeJeune²  ChaMarra K. Saner²  Jayne C. Garno² 

[1] Fax: [phone];Chemistry Department, Louisiana State University, 232 Choppin Hall, Baton Rouge, LA 70803, USA. Telephone: [phone];

关键词: atomic force microscopy;    nanopatterning;    nanostructures;    octadecyltrichlorosilane;    particle lithography;    self-assembled monolayer;    self-assembly;   

DOI  :  10.3762/bjnano.3.12

来源: DOAJ

【 摘 要 】

Particle lithography offers generic capabilities for the high-throughput fabrication of nanopatterns from organosilane self-assembled monolayers, which offers the opportunity to study surface-based chemical reactions at the molecular level. Nanopatterns of octadecyltrichlorosilane (OTS) were prepared on surfaces of Si(111) using designed protocols of particle lithography combined with either vapor deposition, immersion, or contact printing. Changing the physical approaches for applying molecules to masked surfaces produced OTS nanostructures with different shapes and heights. Ring nanostructures, nanodots and uncovered pores of OTS were prepared using three protocols, with OTS surface coverage ranging from 10% to 85%. Thickness measurements from AFM cursor profiles were used to evaluate the orientation and density of the OTS nanostructures. Differences in the thickness and morphology of the OTS nanostructures are disclosed based on atomic force microscopy (AFM) images. Images of OTS nanostructures prepared on Si(111) that were generated by the different approaches provide insight into the self-assembly mechanism of OTS, and particularly into the role of water and solvents in hydrolysis and silanation.

【 授权许可】

Unknown