CORNERSTONE’s Silicon Photonics Rapid Prototyping Platforms: Current Status and Future Outlook

Applied Sciences

Rijan Maharjan¹  Ashim Dhakal¹  Sanket Bohora¹  KrishnaC. Balram²  Ankur Khurana²  Iain Crowe³  HaroldM.H. Chong⁴  ThaliaDominguez Bucio⁵  Xia Chen⁵  GoranZ. Mashanovich⁵  Wei Cao⁵  Weiwei Zhang⁵  Yanli Qi⁵  Lorenzo Mastronardi⁵  Shenghao Liu⁵  Mehdi Banakar⁵  Xingzhao Yan⁵  CallumG. Littlejohns⁵  FredericY. Gardes⁵  DavidJ. Thomson⁵  Fanfan Meng⁵  Milos Nedeljkovic⁵  Bigeng Chen⁵  DavidJ. Rowe⁵  Ke Li⁵  Dehn Tran⁵  GrahamT. Reed⁵  Han Du⁵  Peter O’Brien⁶  Luca Zagaglia⁶  Francesco Floris⁶  EugenioDi Gaetano⁷  Marc Sorel⁷ 

[1] Biophotonics Lab, Phutung Research Institute, Goldhunga, Tarakeshor-5, Kathmandu 44611, Nepal;Department of Electrical & Electronic Engineering, University of Bristol, Bristol BS8 1UB, UK;Department of Electrical and Electronic Engineering and Photon Science Institute, University of Manchester, Manchester M1 3BB, UK;Electronics and Computer Science, University of Southampton, Southampton SO17 1BJ, UK;Optoelectronics Research Centre, University of Southampton, Southampton SO17 1BJ, UK;Photonics Packaging Group, Tyndall National Institute, T12 R5CP Cork, Ireland;School of Engineering, University of Glasgow, Glasgow G12 8LT, UK;

关键词: silicon photonics;    silicon-on-insulator;    waveguides;    modulators;    mid-infrared;    silicon nitride;   

DOI  :  10.3390/app10228201

来源: DOAJ

【 摘 要 】

The field of silicon photonics has experienced widespread adoption in the datacoms industry over the past decade, with a plethora of other applications emerging more recently such as light detection and ranging (LIDAR), sensing, quantum photonics, programmable photonics and artificial intelligence. As a result of this, many commercial complementary metal oxide semiconductor (CMOS) foundries have developed open access silicon photonics process lines, enabling the mass production of silicon photonics systems. On the other side of the spectrum, several research labs, typically within universities, have opened up their facilities for small scale prototyping, commonly exploiting e-beam lithography for wafer patterning. Within this ecosystem, there remains a challenge for early stage researchers to progress their novel and innovate designs from the research lab to the commercial foundries because of the lack of compatibility of the processing technologies (e-beam lithography is not an industry tool). The CORNERSTONE rapid-prototyping capability bridges this gap between research and industry by providing a rapid prototyping fabrication line based on deep-UV lithography to enable seamless scaling up of production volumes, whilst also retaining the ability for device level innovation, crucial for researchers, by offering flexibility in its process flows. This review article presents a summary of the current CORNERSTONE capabilities and an outlook for the future.

【 授权许可】

Unknown