Directed Self-Assembly of Block Copolymers for the Fabrication of Functional Devices

Polymers

LuisGuillermo Villanueva¹  Marta Fernández-Regúlez²  Francesc Pérez-Murano²  Joan Bausells²  Christian Pinto-Gómez² 

[1] Advanced NEMS Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland;Instituto de Microelectrónica de Barcelona (IMB-CNM, CSIC), Campus UAB, 08193 Bellaterra, Spain;

关键词: block copolymers;    directed self-assembly;    graphoepitaxy;    nanolithography;    nanomechanical devices;    nanowires;   

DOI  :  10.3390/polym12102432

来源: DOAJ

【 摘 要 】

Directed self-assembly of block copolymers is a bottom-up approach to nanofabrication that has attracted high interest in recent years due to its inherent simplicity, high throughput, low cost and potential for sub-10 nm resolution. In this paper, we review the main principles of directed self-assembly of block copolymers and give a brief overview of some of the most extended applications. We present a novel fabrication route based on the introduction of directed self-assembly of block copolymers as a patterning option for the fabrication of nanoelectromechanical systems. As a proof of concept, we demonstrate the fabrication of suspended silicon membranes clamped by dense arrays of single-crystal silicon nanowires of sub-10 nm diameter. Resulting devices can be further developed for building up high-sensitive mass sensors based on nanomechanical resonators.

【 授权许可】

Unknown