Breakthroughs in Photonics 2013: X-Ray Optics

IEEE Photonics Journal

Regina Soufli¹ 

[1] Lawrence Livermore National Laboratory, Livermore, CA, USA;

关键词: X-ray optics;    multilayer interference coatings;    metrology;    EUV;    X-ray applications;   

DOI  :  10.1109/JPHOT.2014.2309640

来源: DOAJ

【 摘 要 】

This review discusses the latest advances in extreme ultraviolet/X-ray optics development, which are motivated by the availability and demands of new X-ray sources and scientific and industrial applications. Among the breakthroughs highlighted are the following: i) fabrication, metrology, and mounting technologies for large-area optical substrates with improved figure, roughness, and focusing properties; ii) multilayer coatings with especially optimized layer properties, achieving improved reflectance, stability, and out-of-band suppression; and iii) nanodiffractive optics with improved efficiency and resolution.

【 授权许可】

Unknown