Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4

Royal Society Open Science

Gerhard Franz¹  Daniel Kast¹  Jay J. Senkevich² 

[1] Department of Applied Sciences and Mechatronics, Munich University of Applied Sciences, München, Germany;Massachusetts Institute of Technology, Cambridge, MA, USA;

关键词: precursor;    chemical vapour deposition;    parylene;   

DOI  :  10.1098/rsos.201921

来源: DOAJ

【 摘 要 】

In this work, we present the synthesis of an alternative precursor for chemical vapour deposition of parylene AF-4 to the widely used standard, octafluoro[2.2]paracyclophane. The standard precursor suffers from uncertainties in its supply chain and its synthesis is of low yield. A comparison between different reaction parameters and solvents is drawn by means of thermal, laboratory-scale and microwave-assisted reactions and quantitative nuclear magnetic resonance (qNMR) studies.

【 授权许可】

Unknown