Influence of Chemical Stability on the Fabrication of MnGa-based Devices

Journal of Microelectronic Manufacturing

Lijun Zhu¹  Jianhua Zhao² 

[1] Cornell University Institute of Semiconductors, Chinese Academy of Sciences;Institute of Semiconductors, Chinese Academy of Sciences;

关键词: chemical stability;    perpendicular magnetic anisotropy;    spintronics;    wet etching;   

DOI  :  10.33079/jomm.19020303

来源: DOAJ

【 摘 要 】

Ferromagnetic films of L10-ordered MnGa have shown promise not only in the applications in ultrahigh-density magnetic recording and spintronic memories, oscillators, and sensors, but also in controllable studies of novel electrical transport phenomena. However, the stability of MnGa in chemicals and oxygen plasma that are commonly used in the standard micro-/nano-fabrication process has remained unsettled. In this work, we report a systematic study on the chemical stability of the MnGa films in acids, acetone, ethanol, deionized water, tetramethylammonium hydroxide (TMAOH) and oxygen plasma. We find that MnGa is very stable in acetone and ethanol, while can be attacked substantially if soaked in TMAOH solution for sufficiently long time. Deionized water and acids (e.g., HCl, H3PO4 and H2SO4 solutions) attack MnGa violently and should be avoided whenever possible. In addition, oxygen plasma can passivate the MnGa surface by oxidizing the surface. These results provide important information for the fabrication and the integration of MnGa based spintronic devices.

【 授权许可】

Unknown