The Analysis Of Structure For The Multi-Layered Of Ge/TiO2 Films Prepared By The Differential Prressure Co-Sputtering

Archives of Metallurgy and Materials

Nose M.¹  Adachi Y.²  Matsuda K.²  Abe S.³ 

[1] FACULTY OF ART AND DESIGN, UNIVERSITY OF TOYAMA, JAPAN;GRADUATE SCHOOL OF SCIENCE ;RESEARCH INSTITUTE FOR ELECTROMAGNETIC MATERIALS, JAPAN;

关键词: TiO2;    Ge;    solar cells;    sputtering;   

DOI  :  10.1515/amm-2015-0239

来源: DOAJ

【 摘 要 】

We tried to fabricate the Ge/TiO2 composite films with the differential pressure (pumping) co-sputtering (DPCS) apparatus in order to improve the optical properties. In the study, the micro structure of these thin films has been evaluated. TEM image revealed that the thin film was alternately layered with TiO2 and Ge, lattice fringes were observed both of Ge layer and TiO2 layer. There were portions that lattice fringe of Ge was disturbed near the interface of Ge and TiO2. X-ray photoelectron spectroscopy elucidated that there were few germanium oxides and a part with the thin film after annealed.

【 授权许可】

Unknown