Tailoring the wettability of glass using a double-dielectric barrier discharge reactor

Heliyon

Seong H. Kim¹  Quang Hung Trinh²  Md. Mokter Hossain²  Young Sun Mok² 

[1] Department of Chemical Engineering, Pennsylvania State University, University Park, PA 16802, USA;Department of Chemical and Biological Engineering, Jeju National University, Jeju 690-756, Republic of Korea;

关键词: Condensed matter physics;    Engineering;    Materials science;   

DOI  :  10.1016/j.heliyon.2018.e00522

来源: DOAJ

【 摘 要 】

A double dielectric barrier discharge reactor operated at a low power frequency of 400 Hz and atmospheric pressure was utilized for regulating the wettability of glass surface. The hydrophobic treatment was performed by plasma polymerization of tetramethylsilane (TMS, in argon gas). The obtained results showed that the TMS coatings formed on the glass substrates without oxygen addition were smooth, uniform films with the maximum water contact angle (WCA) of about 106°, which were similar to those obtained by low pressure, high power frequency plasmas reported in the literature. The addition of oxygen into TMS/Ar plasma gas decreased the WCA and induced the formation of SiOSi and/or SiOC linkages, which dominated the existence of Si(CH2)nSi network formed in TMS/Ar (without oxygen) plasma.

【 授权许可】

Unknown