Rapid thermal treatment modes of the Рt-Si system for formation of platinum silicide

Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki

V. A. Gorushko¹  V. A. Pilipenko¹  V. A. Solodukha¹ 

[1] JSC «INTEGRAL» – holding managing company «INTEGRAL»;

关键词: intergrated circuit;    rapid thermal treatment;    platinum silicide;    thermal stresses;   

DOI  :  

来源: DOAJ

【 摘 要 】

Assessment is performed of the permissible nonuniformity of irradiation and temperature scatter as per the wafer area during the rapid thermal treatment, not causing the thermal stresses in it, resultant in the plastic melting or silicon disruption. It was shown, that formation of platinum silicide at Т≤ 810 °С does not cause the negative phenomena in silicon, and it should be performed in the nitrogen environment, whose flooding into the the sealed chamber is done after creation in it of vacuum of 10 –2 mm, mercury column.

【 授权许可】

Unknown