The corrosion resistance and microstructure of UBM system-deposited NbxSiyNz thin films

Ingeniería e Investigación

Leonardo Velasco Estrada¹  Rodolfo Rodríguez Baracaldo¹  Jhon Jairo Olaya Florez¹ 

[1] Universidad Nacional de Colombia;

关键词: Corrosion;    diffraction;    spectroscopy;    fluorescence;    microstructure;    microscopy;    race track;    x ray;    thin film;    sputtering;    polarisation;   

DOI  :  

来源: DOAJ

【 摘 要 】

NbxSiyNz thin film nanostructure was grown using the unbalanced magnetron sputtering (UBM) technique with varying Si content. Corrosion resistance was evaluated by potentiodynamic polarisation technique in a 3% NaCl solution. Microstructure was analysed by X-ray diffraction (XRD), scanning electron microscopy (SEM) and laser scanning microscopy. Chemical composition was ascertained by X-ray fluorescence (XRF) technique. The results showed that deposition rates increased with higher Si content. A microstructural change was observed for greater than 5% Si content through the transition from a crystalline to an amorphous structure in the thin films. Corrosion test results demonstrated that the thin films having the highest silicon content had better corrosion resistance.

【 授权许可】

Unknown