Mechanical and Tribological Properties of Ta-N and Ta-Al-N Coatings Deposited by Reactive High Power Impulse Magnetron Sputtering

Materials

Lucio Litti¹  Moreno Meneghetti¹  Silvia Maria Deambrosis²  Valentina Zin²  Cecilia Mortalò²  Francesco Montagner²  Enrico Miorin² 

[1] Dipartimento di Scienze Chimiche, Università degli Studi di Padova, Via F. Marzolo 1, 35131 Padova, Italy;Institute of Condensed Matter Chemistry and Technologies for Energy—ICMATE, National Research Council—CNR, Corso Stati Uniti 4, 35127 Padova, Italy;

关键词: tantalum nitride;    tantalum aluminum nitride;    high-power impulse magnetron sputtering;    mechanical properties of films;    tribological properties;    wear resistance;   

DOI  :  10.3390/ma15093354

来源: DOAJ

【 摘 要 】

In this article, the depositions and functional characterizations of Ta-N and Ta-Al-N coatings for protection purposes, grown by reactive high-power impulse magnetron sputtering onto silicon substrates, are described. Nitride films were grown while changing the substrate polarization voltage (i.e., the applied bias voltage) during the process. Moreover, the effects of adding Al to form a ternary system and the resulting variation of the coatings’ mechanical and tribological properties have been widely investigated by nanoindentation, scratch, and wear tests. Micro-Raman characterization has been applied to the wear tracks to explore the comprehensive tribo-environment and wear mechanism. Interestingly, Ta-Al-N films, despite significantly improved mechanical properties, show a premature failure with respect to Ta-N coatings. The wear mechanisms of Ta-N and Ta-Al-N systems were revealed to be very different. Indeed, Ta-Al-N films suffer higher oxidation phenomena during wear, with the formation of an oxidized surface tribofilm and a reduced wear resistance, while Ta-N coatings undergo plastic deformation at the wear surface, with a slightly adhesive effect.

【 授权许可】

Unknown