期刊论文详细信息
Tekhnologiya i Konstruirovanie v Elektronnoi Apparature | |
Modification of spin-on-glass films properties during the thermal and plasma treatments | |
关键词: film structure; etching rate; transmission spectrum; | |
DOI : | |
来源: DOAJ |
【 摘 要 】
It is established, that the estimation of quality of a film after various technological operations of IC manufacturing can be realized by means of changing the transmission spectrum of the film. It allows to exclude rejects of ICs caused by breakage of a metal layer.
【 授权许可】
Unknown