期刊论文详细信息
Nano-Micro Letters | |
High Yield Transfer of Clean Large-Area Epitaxial Oxide Thin Films | |
Chao Yun1  Bowen Zhang1  Judith L. MacManus-Driscoll1  | |
[1] Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, CB3 0FS, Cambridge, UK; | |
关键词: Free-standing oxide thin films; High yield transfer; Wet etching; Crack prevention; | |
DOI : 10.1007/s40820-020-00573-4 | |
来源: Springer | |
【 摘 要 】
tsA new way to achieve high yield and large area oxide thin film transfer is developed. Three different film compositions are demonstrated: SrRuO3, CeO2, and CeO2/STO nanocomposite films.Cracks, wrinkles, and damages are prevented by the new transfer method. They are commonly introduced by conventional transfer processes. Vertically aligned nanocomposite (VAN) structures can further improve the transfer yield. Possible mechanisms related to increased fracture toughness are proposed. We have opened up a route to large-scale oxide thin-film-based electronic device applications.
【 授权许可】
CC BY
【 预 览 】
Files | Size | Format | View |
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RO202203048847673ZK.pdf | 2218KB | download |