Fabrication of High-Density Out-of-Plane Microneedle Arrays with Various Heights and Diverse Cross-Sectional Shapes

Nano-Micro Letters

Byung Chul Lee¹  Young Jun Yoon¹  Maesoon Im²  Hyeonhee Roh³  Jin Soo Park³  Dong-Hyun Kang⁴  Seung Min Kwak⁴ 

[1] Brain Science Institute, Korea Institute of Science and Technology (KIST), 02792, Seoul, South Korea;Brain Science Institute, Korea Institute of Science and Technology (KIST), 02792, Seoul, South Korea;Division of Bio-Medical Science & Technology, KIST School, University of Science & Technology (UST), 02792, Seoul, South Korea;Brain Science Institute, Korea Institute of Science and Technology (KIST), 02792, Seoul, South Korea;Division of Electrical Engineering, College of Engineering, Korea University, 02841, Seoul, South Korea;Micro/Nano Fabrication Center, KIST, 02792, Seoul, South Korea;

关键词: Microneedle;    Various heights;    Cross-sectional shapes;    Isotropic etch;    Deep reactive ion etching;   

DOI  :  10.1007/s40820-021-00778-1

来源: Springer

【 摘 要 】

tsHigh-density out-of-plane microneedle arrays were fabricated with a single photolithography and two deep reactive ion etching (DRIE) steps in anisotropic and isotropic modes, respectively.Microneedles in various heights were monolithically created by the identical DRIE processes and scanning electron microscopy images showed extremely sharp sub-micron (~145-nm-wide) tip.Diverse cross-sectional shapes of microneedles were implemented by altering photomask patterns.

【 授权许可】

CC BY