Nanographene device fabrication using atomic force microscope

Micro & nano letters

article

Muneer Ahmad¹  Yongho Seo¹  Young Jin Choi³ 

[1] Graphene Research Institute, Sejong University;Faculty of Nanotechnology & Advanced Material Engineering and Graphene Research Institute, Sejong University;Department of Physics, and Department of Nano Science and Engineering, MyongJi University

关键词: anodisation;    atomic force microscopy;    chemical vapour deposition;    nanofabrication;    nanolithography;    Raman spectra;    graphene;    C;    lithography;    controlled humidity condition;    tip speed;    tip voltage;    two terminal bar like device;    graphene film;    film thickness;    film uniformity;    Raman spectroscopy;    chemical vapour deposition;    local anodic oxidation;    contact mode atomic force microscopy;    nanographene device fabrication;   

DOI  :  10.1049/mnl.2013.0199

学科分类：计算机科学（综合）

来源: Wiley

【 摘 要 】

A report is presented on the local anodic oxidation of graphene film prepared by chemical vapour deposition using contact mode atomic force microscopy. Raman spectroscopy was used to check the uniformity and thickness of large area graphene film. Various kinds of patterns such as lines, ribbons and further, more complex structures, such as hexagons, two-terminal bar-like devices, were written by varying the tip voltage from −6 to −12 V and the tip speed from 60 to 200 nm/s. It was found that one can easily write any kind of patterns by just manipulating the tip voltage and tip speed instead of concentrating on other factors such as controlled humidity conditions, applied force on the tip and tip current. Also, it is confirmed that with an increase in tip voltage and by slowing the tip movement during lithography, one can write very narrow and sharp patterns which are important factors for the fabrication of graphene-based electronic devices.

【 授权许可】

CC BY|CC BY-ND|CC BY-NC|CC BY-NC-ND