Effective improvement in the etching characteristics of Si{110} in low concentration TMAH solution

Micro & nano letters

article

Veerla Swarnalatha¹  Avvaru Venkata Narasimha Rao¹  Prem Pal¹ 

[1] MEMS and Micro/Nano Systems Laboratory, Department of Physics, Indian Institute of Technology Hyderabad

关键词: micromachining;    micromechanical devices;    elemental semiconductors;    silicon;    surface morphology;    sputter etching;    crystal microstructure;    nanofabrication;    microstructures;    silicon wafer;    etching characteristics;    etched surface morphology;    silicon micromachining;    low concentration TMAH solution;    aqueous tetramethylammonium hydroxide solution;    silicon wet anisotropic etching;    bulk micromachining;    reducing agent hydroxylamine;    microelectromechanical systems;    Si;   

DOI  :  10.1049/mnl.2017.0610

学科分类：计算机科学（综合）

来源: Wiley

【 摘 要 】

Abstract       The target derivative are gentamicin linked with L-Val- L-Ala by an ester linkage. These were synthesized by esterification method, which included the reaction of -OH hydroxyl group on (carbon No.5) of gentamicin with the acid chloride of the corresponding dipeptide, The preparation of new derivative of gentamicin involved protected the primary & secondary amine groups of Gentamicin, by Ethylchloroformate (ECF) to give N-carbomethoxy Gentamicin which was used for further chemical synthesis involving the free hydroxyl groups. Then prepared dipeptide (L-Val- L-Ala) by conventional solution method in present DCC & HoBt then reacted with thionyl chloride to prepared acid chloride of dipeptides, then after, linked by ester linkage to N-protection gentamicin in present pyridine as base, finally deportation the amino group of synthesized compound by using TFAA in present anisole. The characterization of the titled compounds were performed utilizing FTIR spectroscopy, CHNS elemental analysis, and by measurements of their physical properties.

【 授权许可】

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