Anisotropic etching in low-concentration KOH: effects of surfactant concentration

Micro & nano letters

article

Prem Pal¹  Akarapu Ashok¹  Subhomoy Haldar¹  Yan Xing²  Kazuo Sato³ 

[1] Department of Physics Indian Institute of Technology Hyderabad, MEMS and Micro/Nano Systems Laboratory;Laboratory of Micro-Nano Medical Devices, Department of Mechanical Engineering, Southeast University;Department of Mechanical Engineering, Aichi Institute of Technology

关键词: silicon;    elemental semiconductors;    surfactants;    etching;    silicon compounds;    micromechanical devices;    SiO2;    Si;    temperature 60 degC to 76 degC;    mask corners;    mask edges;    minimum undercutting;    conformal etching;    convex corners;    silicon dioxide micromechanical structure fabrication;    etchant;    etch mask;    oxide layer;    Triton X-100;    surfactant-added low-concentration potassium hydroxide;    etch rate;    tetramethylammonium hydroxide;    Si{100} plane;    Si{111} plane;    surfactant concentration effects;    anisotropic etching;   

DOI  :  10.1049/mnl.2014.0685

学科分类：计算机科学（综合）

来源: Wiley

【 摘 要 】

ABSTRACTInsulinomas are an uncommon cause for recurrent hypoglycemia. Surgical resection is the definitive treatment. We present a case of an 87 year old female patient diagnosed with insulinoma who had history of recurrent hypoglycemic attacks and neurological deficits due to seizure induced hypoxic episodes. Laparoscopic enucleation of the tumor was undertaken. Perioperative management of blood sugar in these patients is of utmost importance. As anesthesiologists our target is to prevent severe hypoglycemic episodes which may lead to permanent neurological damage and severe hyperglycemia post procedure which has to be managed by titrating the dose of insulin and dextrose.Key words: Insulinoma; Hypoglycemia; Laparoscopy; Neuroendocrine tumors.

【 授权许可】

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