High-reflection optical thin films based on SiO 2 /TiO 2 nanoparticles multilayers by dip coating

Micro & nano letters

article

Wang Yuehui¹  Yang Xing² 

[1] Department of Materials and Food, University of Electronic Science and Technology of China Zhongshan Institute;School of Electronic Science and Engineering, University of Electronic Science and Technology

关键词: atomic force microscopy;    scanning electron microscopy;    distributed Bragg reflectors;    optical multilayers;    dip coating;    reflectivity;    nanoparticles;    refractive index;    silicon compounds;    titanium compounds;    semiconductor materials;    nanofabrication;    semiconductor thin films;    semiconductor growth;    SiO2-TiO2;    wavelength 1600.0 nm;    wavelength 800.0 nm;    thickness uniformity;    scanning electron microscopy;    atomic force microscopy;    refractive index;    nanoparticles multilayers;    quarter-wave layers;    dip coating method;    silicon wafer;    distributed Bragg reflectors;    high-reflection optical thin films;    electromagnetic spectrum;    peak reflectance region;   

DOI  :  10.1049/mnl.2018.0045

学科分类：计算机科学（综合）

来源: Wiley

【 摘 要 】

The alternately stacking layers of SiO 2 and TiO 2 nanoparticles with different refractive indices were fabricated to form the distributed Bragg reflectors on the silicon wafer by dip coating method. By appropriate design of the thickness of the quarter-wave layers, the peak reflectance region can be tuned from the blue-green to the infrared portion of the electromagnetic spectrum. The peak reflectance of 65% at 800 nm and at 1600 nm has been achieved using seven periods, respectively; meanwhile, compared with the simulation, 80% at 800 nm and 70% at 1620 nm for seven periods, respectively. The scanning electron microscopy and the atomic force microscope studies confirm the thickness uniformity achieved along the fabrication direction, and a good quality of surfaces and interfaces.

【 授权许可】

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