Influence of surface roughness on the adhesion hysteresis of nano thin film

Micro & nano letters

article

Qijing Lin¹  Fuzheng Zhang²  Feng Han¹  Man Zhao²  Zhuangde Jiang² 

[1] Collaborative Innovation Center of High-End Manufacturing Equipment, Xi'an Jiaotong University;State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University;Xi'an Jiaotong University Suzhou Institute;State Key Laboratory of Mechanical System and Vibration, Shanghai Jiaotong University

关键词: adhesion;    surface roughness;    atomic force microscopy;    sputter deposition;    thin films;    nanostructured materials;    nanofabrication;    surface roughness;    surface adhesion forces;    force-displacement curves;    atomic force microscopy;    load curve;    closed curve;    adhesion hysteresis;    copper nano thin film;    Johnson–Kendall–Roberts model;    Cu;   

DOI  :  10.1049/mnl.2019.0364

学科分类：计算机科学（综合）

来源: Wiley

【 摘 要 】

The influence of surface roughness on adhesion hysteresis of Cu thin films with different thickness was studied. The Cu thin films were fabricated using dc magnetron sputtering technology and their surface adhesion forces were measured using force-displacement curves of atomic force microscopy. The experiment results show that the unload curve exhibits obvious adhesion hysteresis and that the roughness and adhesion force have opposite change tendency. The theoretical analysis on the influence of thin film roughness to the adhesion hysteresis was carried out using the Johnson–Kendall–Roberts model. The results show that the load curve and unload curve constitute a closed curve and that the smoother the surface, the more obvious adhesion hysteresis, i.e. the rougher the surface, the less obvious adhesion hysteresis. The theoretical analysis results are in good agreement with the experimental results.

【 授权许可】

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