Waveguide integrated GaN distributed Bragg reflector cavity using low-cost nanolithography

Micro & nano letters

article

Simeng Jia¹  Emmanuel D. Le Boulbar²  Krishna C. Balram¹  Jon R. Pugh¹  Tao Wang³  Duncan W.E. Allsopp²  Philip A. Shields²  Martin J. Cryan¹ 

[1] Department of Electrical and Electronic Engineering, University of Bristol;Department of Electrical and Electronic Engineering, University of Bath;Department of Electronic and Electrical Engineering, University of Sheffield

关键词: integrated optics;    diffraction gratings;    optical couplers;    III-V semiconductors;    gallium compounds;    nanolithography;    photolithography;    optical waveguides;    finite difference time-domain analysis;    distributed Bragg reflectors;    optical fabrication;    wide band gap semiconductors;    optical design techniques;    Bragg reflector cavity;    gallium nitride distributed Bragg reflector cavities;    output grating couplers;    low-cost nanolithography technique;    displacement Talbot lithography;    direct laser writing lithography;    finite-difference time-domain method;    biosensing;    waveguide integrated GaN distributed Bragg reflector cavity;    input grating couplers;    GaN integrated photonics;    GaN;   

DOI  :  10.1049/mnl.2019.0366

学科分类：计算机科学（综合）

来源: Wiley

【 摘 要 】

This work presents the design, fabrication and measurement of gallium nitride (GaN) distributed Bragg reflector cavities integrated with input and output grating couplers. The devices are fabricated using a new, low-cost nanolithography technique: displacement Talbot lithography combined with direct laser writing lithography. The finite-difference time-domain method has been used to design all the components and measured and modelled results show good agreement. Such devices have applications in GaN integrated photonics and biosensing.

【 授权许可】

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