Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures

Micromachines

Guy M. Burrow¹ 

[1] School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA 30332, USA; E-Mail

关键词: multi-beam interference;    interference lithography;    nano-electronics;    photonic crystals;    metamaterials;    subwavelength structures;    optical trapping;    biomedical structures;   

DOI  :  10.3390/mi2020221

来源: mdpi

【 摘 要 】

Research in recent years has greatly advanced the understanding and capabilities of multi-beam interference (MBI). With this technology it is now possible to generate a wide range of one-, two-, and three-dimensional periodic optical-intensity distributions at the micro- and nano-scale over a large length/area/volume. These patterns may be used directly or recorded in photo-sensitive materials using multi-beam interference lithography (MBIL) to accomplish subwavelength patterning. Advances in MBI and MBIL and a very wide range of applications areas including nano-electronics, photonic crystals, metamaterials, subwavelength structures, optical trapping, and biomedical structures are reviewed and put into a unified perspective.

【 授权许可】

CC BY   
© 2011 by the authors; licensee MDPI, Basel, Switzerland.