The pH Sensing Properties of RF Sputtered RuO2 Thin-Film Prepared Using Different Ar/O2 Flow Ratio

Materials

Ali Sardarinejad¹  Devendra Kumar Maurya²  Kamal Alameh² 

[1] Electron Science Research Institute, Edith Cowan University, Joondalup, WA 6027, Australia;

关键词: thin film;    sputtering;    metal oxide;    pH sensing;    electrochemical properties;   

DOI  :  10.3390/ma8063352

来源: mdpi

【 摘 要 】

The influence of the Ar/O₂ gas ratio during radio frequency (RF) sputtering of the RuO₂ sensing electrode on the pH sensing performance is investigated. The developed pH sensor consists in an RF sputtered ruthenium oxide thin-film sensing electrode, in conjunction with an electroplated Ag/AgCl reference electrode. The performance and characterization of the developed pH sensors in terms of sensitivity, response time, stability, reversibility, and hysteresis are investigated. Experimental results show that the pH sensor exhibits super-Nernstian slopes in the range of 64.33–73.83 mV/pH for Ar/O₂ gas ratio between 10/0–7/3. In particular, the best pH sensing performance, in terms of sensitivity, response time, reversibility and hysteresis, is achieved when the Ar/O₂ gas ratio is 8/2, at which a high sensitivity, a low hysteresis and a short response time are attained simultaneously.

【 授权许可】

CC BY   
© 2015 by the authors; licensee MDPI, Basel, Switzerland.