Nanoimprinted Hybrid Metal-Semiconductor Plasmonic Multilayers with Controlled Surface Nano Architecture for Applications in NIR Detectors

Materials

Akram A. Khosroabadi²  Palash Gangopadhyay¹  Steven Hernandez²  Kyungjo Kim²  Nasser Peyghambarian²  Robert A. Norwood² 

[1] College of Optical Sciences, the University of Arizona, Tucson 85721, AZ, USA;

关键词: surface plasmon;    metal semiconductor interface;    silicon;    photodetectors;    infrared;   

DOI  :  10.3390/ma8085028

来源: mdpi

【 摘 要 】

We present a proof of concept for tunable plasmon resonance frequencies in a core shell nano-architectured hybrid metal-semiconductor multilayer structure, with Ag as the active shell and ITO as the dielectric modulation media. Our method relies on the collective change in the dielectric function within the metal semiconductor interface to control the surface. Here we report fabrication and optical spectroscopy studies of large-area, nanostructured, hybrid silver and indium tin oxide (ITO) structures, with feature sizes below 100 nm and a controlled surface architecture. The optical and electrical properties of these core shell electrodes, including the surface plasmon frequency, can be tuned by suitably changing the order and thickness of the dielectric layers. By varying the dimensions of the nanopillars, the surface plasmon wavelength of the nanopillar Ag can be tuned from 650 to 690 nm. Adding layers of ITO to the structure further shifts the resonance wavelength toward the IR region and, depending on the sequence and thickness of the layers within the structure, we show that such structures can be applied in sensing devices including enhancing silicon as a photodetection material.

【 授权许可】

CC BY   
© 2015 by the authors; licensee MDPI, Basel, Switzerland.