The Morphology of Ordered Block Copolymer Patterns as Probed by High Resolution Imaging

Nanomaterials and Nanotechnology

M A Morris¹  J D Holmes¹  A Chaudhari¹  D Borah¹  M T Shaw¹  N Petkov¹  A P Bell¹  T Ghoshal¹ 

关键词: Block Copolymer;    Thin Films;    Defects;    Polystyrene-b-polymethylmethacrylate;    Polystyrene-b-polyethylene Oxide;    Polystyrene-b-polydimethyl Siloxane;    Polystyrene-b-polyvinylypyridine;    Electron Microscopy;    Helium Ion Microscopy;   

DOI  :  10.5772/59098

来源: InTech

【 摘 要 】

The microphase separation of block copolymer (BCP) thin films can afford a simple and cost-effective means to studying nanopattern surfaces, and especially the fabrication of nanocircuitry. However, because of complex interface effects and other complications, their 3D morphology, which is often critical for application, can be more complex than first thought. Here, we describe how emerging microscopic methods may be used to study complex BCP patterns and reveal their rich detail. These methods include helium ion microscopy (HIM) and high resolution x-section transmission electron microscopy (XTEM), and complement conventional secondary electron and atomic force microscopies (SEM and TEM). These techniques reveal that these structures are quite different to what might be expected. We illustrate the advances in the understanding of BCP thin film morphology in several systems, which result from this characterization. The systems described include symmetric, lamellar forming polystyrene-b-polymethylmethacryl...

【 授权许可】

Unknown