Preparation of Thin Palladium Membranes by a Novel Method Based on Photolithography and Electrolysis

JOURNAL OF CHEMICAL ENGINEERING OF JAPAN

KATSUKI KUSAKABE¹  MAKOTO TAKAHASHI¹  SHIGEHARU MOROOKA¹  HIDEAKI MAEDA² 

[1] Department of Applied Chemistry, Kyushu University;Department of Inorganic Materials, Kyushu National Industrial Research Institute (KNIRI)

关键词: Palladium Membrane;    Photolithography;    Electrodeposition;    Hydrogen Separation;    Selectivity;   

DOI  :  10.1252/jcej.34.703

来源: Maruzen Company Ltd

【 摘 要 】

References(10)Cited-By(5)A negative resist was spin-coated on the surface of a 50-μm thick copper film, and was solidified as a protection film. A palladium layer was then electrodeposited on the other uncovered surface. After removing the protection film, the resist was again spin-coated on the copper surface, and a pattern of microslits was transferred by photolithography. After development, the microslits were electrolytically etched out. Thus a palladium membrane of 5 mm in diameter was formed as an assemblage of thin layers formed in the microslits. The palladium membranes prepared were characterized by SEM observation, as well as by permeation measurements for hydrogen and nitrogen at 573-873 K. The palladium membrane, which was 3 μm in thickness and formed on a polished copper film, showed separation factor of hydrogen to nitrogen of 120 at 873 K.

【 授权许可】

Unknown