Summary of Chalcogenide Glass Processing: Wet-Etching and Photolithography

Riley, Brian J. ; Sundaram, S. K. ; Johnson, Bradley R. ; Saraf, Laxmikant V.

Pacific Northwest National Laboratory (U.S.)

关键词: Chalcogenides;    Photolithography;    Chalcogenide;    Sodium Hydroxides;    Wet-Etching;   

DOI  :  10.2172/1031443
RP-ID  :  PNNL-16639
RP-ID  :  AC05-76RL01830
RP-ID  :  1031443

美国|英语

来源: UNT Digital Library

【 摘 要 】

This report describes a study designed to explore the different properties of two different chalcogenide materials, As2S3 and As24S38Se38, when subjected to photolithographic wet-etching techniques. Chalcogenide glasses are made by combining chalcogen elements S, Se, and Te with Group IV and/or V elements. The etchant was selected from the literature and was composed of sodium hydroxide, isopropyl alcohol, and deionized water and the types of chalcogenide glass for study were As2S3 and As24S38Se38. The main goals here were to obtain a single variable etch rate curve of etch depth per time versus NaOH overall solution concentration in M and to see the difference in etch rate between a given etchant when used on the different chalcogenide stoichiometries. Upon completion of these two goals, future studies will begin to explore creating complex, integrated photonic devices via these methods.