A STUDY OF THE FORMATION OF WATER MARKS FROM MEMBRANE-DISTILLED WATER AND ULTRAPURE WATER

JOURNAL OF CHEMICAL ENGINEERING OF JAPAN

HIDEAKI KUROKAWA¹  HARUMI MATSUZAKI¹  KATSUYA EBARA¹  SANKICHI TAKAHASHI¹  ISAO OOKOUCHI¹ 

[1] Hitachi Research Laboratory, Hitachi Ltd.

关键词: Water Mark;    Evaporation;    Ultrapure Water;    Silicon Wafer;    Organic Matter;   

DOI  :  10.1252/jcej.21.490

来源: Maruzen Company Ltd

【 摘 要 】

References(3)Effects of evaporation temperature on the formation of water marks left on a Si wafer were studied using membrane-distilled water and ultrapure water. The main constituent of water marks from membrane-distilled water was found to be liquid hydrocarbon, with some C = C bonds present, and when evaporation velocity was greater than about 20 kg/(m2•h) evaporation could take place without marks formation. Water marks from ultrapure water had a higher boiling point than those from membrane-distilled water and were left on a Si wafer even when the water was evaporated at a velocity of about 20kg/(m2• h).

【 授权许可】

Unknown