Influence of argon plasma treatment on polyethersulphone surface

Pramana

S Mukherjee¹  U P Deshpande³  N L Singh1²  R S Rane¹  T Shripathi³  S M Pelagade²  V Ganeshan³ 

[1] FCIPT, Institute for Plasma Research, Gandhinagar 382 044, India$$;Department of Physics, M.S. University of Baroda, Vadodara 390 002, India$$;UGC-DAE-CSR, University Campus, Khandawa Road, Indore 452 017, India$$

关键词: Polyethersulphone;    Ar plasma;    surface energy;    X-ray photoelectron spectroscopy;    atomic force microscopy;    microhardness.;   

DOI  :  

学科分类：物理（综合）

来源: Indian Academy of Sciences

【 摘 要 】

Polyethersulphone (PES) was modified to improve the hydrophilicity of its surface, which in turn helps in improving its adhesive property. The modified PES surface was characterized by contact angle measurement, X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and Vicker’s microhardness measurement. The contact angles of the modified PES reduces from 49° to 10° for water. The surface free energy (SFE) calculated from measured contact angles increases from 66.3 to 79.5 mJ/m2 with the increase in plasma treatment time. The increase in SFE after plasma treatment is attributed to the functionalization of the polymer surface with hydrophilic groups. The XPS analysis shows that the ratio of O/C increases from 0.177 to 0.277 for modified PES polymer. AFM shows that the average surface roughness increases from 6.9 nm to 23.7 nm due to the increase in plasma treatment time. The microhardness of the film also increases with plasma treatment.

【 授权许可】

Unknown