Plasma Processes : Microwave plasma deposition of diamond like carbon coatings

Pramana

N Venkatramani¹  D S Patil¹  R D'Cunha²  K Ramachandran¹  M Pandey² 

[1] Laser and Plasma Technology Division, Bhabha Atomic Research Centre, Trombay, Mumbai 400 085, India$$;Spectroscopy Division, Bhabha Atomic Research Centre, Trombay, Mumbai 400 085, India$$

关键词: Microwave;    diamond like carbon;    chemical vapour deposition.;   

DOI  :  

学科分类：物理（综合）

来源: Indian Academy of Sciences

【 摘 要 】

The promising applications of the microwave plasmas have been appearing in the fields of chemical processes and semiconductor manufacturing. Applications include surface deposition of all types including diamond/diamond like carbon (DLC) coatings, etching of semiconductors, promotion of organic reactions, etching of polymers to improve bonding of the other materials etc. With a 2.45 GHz, 700 W, microwave induced plasma chemical vapor deposition (CVD) system set up in our laboratory we have deposited diamond like carbon coatings. The microwave plasma generation was effected using a wave guide single mode applicator. We have deposited DLC coatings on the substrates like stainless steel, Cu–Be, Cu and Si. The deposited coatings have been characterized by FTIR, Raman spectroscopy and ellipsometric techniques. The results show that we have achieved depositing ∼ 95% sp3 bonded carbon in the films. The films are uniform with golden yellow color. The films are found to be excellent insulators. The ellipsometric measurements of optical constant on silicon substrates indicate that the films are transparent above 900 nm.

【 授权许可】

Unknown