Bulletin of the Korean chemical society | |
Directionality of o-Phthalaldehyde adsorbed onto H-passivated Si(100) Surface Characterized by NEXAFS and HRPES | |
Tai Hee Kang1  Hangil Lee1  Sena Yang1  Bongsoo Kim1  Ki jeong Kim1  | |
关键词: o-Phthalaldehyde; H-Si(100); HRPES; NEXAFS; 1-D Organic molecular line; | |
DOI : | |
学科分类:化学(综合) | |
来源: Korean Chemical Society | |
【 摘 要 】
The electronic and adsorption structure of o-phthalaldehyde (OPA) on the H-Si(100) surface was investigated by using Near Edge X-ray Fine Structure (NEXAFS) and high resolution photoemission spectroscopy (HRPES). We confirmed that the OPA grown on the H-Si(100) surface showed good dependency with about 60 degree tilting angle using NEXAFS and a single O 1s peak by using HRPES. Hydrogen atom passivated on the Si(100) surface was found to be a seed for making one dimensional organic line that uses a chain reaction as the H-Si(100) surface was compared with the hydrogen free Si(100) surface.
【 授权许可】
Unknown
【 预 览 】
Files | Size | Format | View |
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RO201912010242364ZK.pdf | 945KB | download |