Reaction of Gas-Phase Bromine Atom with Chemisorbed Hydrogen Atoms on a Silicon(100)-(2¡¿1) Surface

Bulletin of the Korean chemical society

Kyung Soon Chang¹  Kyeong Hwan Moon¹  Jongbaik Ree¹  Yoo Hang Kim¹ 

关键词: Bromine;    Hydrogen;    Silicon;    Eley-Rideal;    Hot-atom.;   

DOI  :  

学科分类：化学（综合）

来源: Korean Chemical Society

【 摘 要 】

The reaction of gas-phase atomic bromine with highly covered chemisorbed hydrogen atoms on a silicon surface is studied by use of the classical trajectory approach. It is found that the major reaction is the formation of HBr(g), and it proceeds through two modes, that is, direct Eley-Rideal and hot-atom mechanism. The HBr formation reaction takes place on a picosecond time scale with most of the reaction exothermicity depositing in the product vibration and translation. The adsorption of Br(g) on the surface is the second most efficient reaction pathway. The total reaction cross sections are 2.53�?² for the HBr formation and 2.32�?² for the adsorption of Br(g) at gas temperature 1500 K and surface temperature 300 K.

【 授权许可】

Unknown