Influence of deposition rate on PL spectrum and surface morphology of ZnO nanolayers deposited on Si (100) substrate

Bulletin of materials science

A Zendehnam¹  S Miri¹  M Mirzaee¹ 

[1] Thin Film Laboratory, Department of Physics, Faculty of Science, Arak University, Arak 38156-8-8349, Iran$$Thin Film Laboratory, Department of Physics, Faculty of Science, Arak University, Arak 38156-8-8349, IranThin Film Laboratory, Department of Physics, Faculty of Science, Arak University, Arak 38156-8-8349, Iran$$

关键词: ZnO;    Si substrate;    deposition rate;    AFM/SEM;    PL.;   

DOI  :  

学科分类：材料工程

来源: Indian Academy of Sciences

【 摘 要 】

Zinc oxide (ZnO) thin films were deposited on Si (100) substrate through sputtering of zinc by DC magnetron, followed by thermal oxidation. Different deposition rates were used in coating films with 100 nm thickness (0.6�??4.5 nm/s). Photoluminescence spectra of the produced samples were obtained and it was found that the violet emission peak intensity increases with deposition rate. Scanning electron microscopy (SEM) micrograph and atomic force microscopy (AFM) images for the zinc oxide films were obtained. Morphological changes due to various deposition rate are discussed in the light of changes observed in the ZnO crystals. Low coating rates produced smooth surface with small grains while higher deposition rates increased the surface roughness and larger grain size. AFM and SEM results are in good agreement and support the PL results.

【 授权许可】

Unknown