Structural and optical characterization of thick and thin polycrystalline diamond films deposited by microwave plasma activated CVD

Bulletin of materials science

B Satpati¹  B P Bag¹  S K Pradhan¹  T Sharda² 

[1] Institute of Minerals and Materials Technology, Bhubaneswar 751 013, India$$Institute of Minerals and Materials Technology, Bhubaneswar 751 013, IndiaInstitute of Minerals and Materials Technology, Bhubaneswar 751 013, India$$;Seki Technotron Corporation, 5-6-30 Kiba, Koto-ku, Tokyo 135 042, Japan$$Seki Technotron Corporation, 5-6-30 Kiba, Koto-ku, Tokyo 135 042, JapanSeki Technotron Corporation, 5-6-30 Kiba, Koto-ku, Tokyo 135 042, Japan$$

关键词: Diamond film;    plasma CVD;    defects;    optical properties.;   

DOI  :  

学科分类：材料工程

来源: Indian Academy of Sciences

【 摘 要 】

Preliminary results of growth of thin diamond film in a recently installed 3 kW capacity microwave plasma activated CVD (MW-PACVD) system are being reported. The films were deposited on Si (100) substrate at 850°C using methane and hydrogen mixture at 1.5 kW MW power. The grown polycrystalline films were characterized by micro-Raman, transmission electron microscope (TEM), spectrophotometer and atomic force microscope (AFM). The results were compared with that of a thicker diamond film grown elsewhere in a same make MWPACVD system at relatively higher power densities. The presence of a sharp Raman peak at 1332 cm^-1 confirmed the growth of diamond, and transmission spectra showed typical diamond film characteristics in both the samples. Typical twin bands and also a quintuplet twinned crystal were observed in TEM, further it was found that the twinned region in thin sample composed of very fine platelet like structure.

【 授权许可】

Unknown