Electroless deposition, post annealing and characterization of nickel films on silicon

Bulletin of materials science

Subir Sabharwal³  Sangeeta²  Siddharth Palit⁴  A K Poswal²  R B Tokas¹ 

[1] Spectroscopy Division, TPPED, Bhabha Atomic Research Centre, Mumbai 400 085, India$$Spectroscopy Division, TPPED, Bhabha Atomic Research Centre, Mumbai 400 085, IndiaSpectroscopy Division, TPPED, Bhabha Atomic Research Centre, Mumbai 400 085, India$$;Crystal Technology Laboratory, TPPED, Bhabha Atomic Research Centre, Mumbai 400 085, India$$Crystal Technology Laboratory, TPPED, Bhabha Atomic Research Centre, Mumbai 400 085, IndiaCrystal Technology Laboratory, TPPED, Bhabha Atomic Research Centre, Mumbai 400 085, India$$;Department of Metallurgical & Materials Engineering, Indian Institute of Technology, Roorkee 247 667, India$$Department of Physics, Columbia University, New York, USA$$Department of Metallurgical & Materials Engineering, Indian Institute of Technology, Roorkee 247 667, IndiaDepartment of Metallurgical & Materials Engineering, Indian Institute of Technology, Roorkee 247 667, India$$Department of Physics, Columbia University, New York, USA$$Department of Physics, Columbia University, New York, USADepartment of Metallurgical & Materials Engineering, Indian Institute of Technology, Roorkee 247 667, India$$Department of Physics, Columbia University, New York, USA$$;Department of Metallurgical & Materials Engineering, Indian Institute of Technology, Roorkee 247 667, India$$Department of Metallurgical & Materials Engineering, Indian Institute of Technology, Roorkee 247 667, IndiaDepartment of Metallurgical & Materials Engineering, Indian Institute of Technology, Roorkee 247 667, India$$

关键词: Electroless deposition;    X-ray diffraction;    scanning probe microscopy;    nickel film.;   

DOI  :  

学科分类：材料工程

来源: Indian Academy of Sciences

【 摘 要 】

Electroless deposition of nickel (EN) films on �??-type silicon has been investigated under different process conditions. The interface between the film and substrate has been characterized for electrical properties by probing the contact resistances. X-ray diffraction and atomic force microscopy have been performed to obtain information about the structural and morphological details of the films. As a comparative study, nickel films have also been sputter deposited on silicon substrates. An as-deposited electroless film is observed to form non-ohmic contact while in a sputtered film prepared without the application of substrate heating, the formation of metal�?�insulating�?�semiconductor type junction is seen.

【 授权许可】

Unknown