期刊论文详细信息
Bulletin of materials science
Soft lithography meets self-organization: Some new developments in meso-patterning
Ganesh Patil2  Rabibrata Mukherjee1  Partho Sarathi Gooh Pattader2  Danish Faruqui2  Ashutosh Sharma2 
[1] Department of Chemical Engineering, Indian Institute of Technology, Kanpur 208 016, India$$Central Glass and Ceramic Research Institute, Kolkata 700 032, India$$Department of Chemical Engineering, Indian Institute of Technology, Kanpur 208 016, IndiaDepartment of Chemical Engineering, Indian Institute of Technology, Kanpur 208 016, India$$Central Glass and Ceramic Research Institute, Kolkata 700 032, India$$Central Glass and Ceramic Research Institute, Kolkata 700 032, IndiaDepartment of Chemical Engineering, Indian Institute of Technology, Kanpur 208 016, India$$Central Glass and Ceramic Research Institute, Kolkata 700 032, India$$;Department of Chemical Engineering, Indian Institute of Technology, Kanpur 208 016, India$$Department of Chemical Engineering, Indian Institute of Technology, Kanpur 208 016, IndiaDepartment of Chemical Engineering, Indian Institute of Technology, Kanpur 208 016, India$$
关键词: Self-organization;    meso-patterning;    visco-elastic film;    imprinting;    adhesion;    soft lithography.;   
DOI  :  
学科分类:材料工程
来源: Indian Academy of Sciences
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【 摘 要 】

This is a brief review of our recent and ongoing work on simple, rapid, room temperature, pressure- less and large area (∼ cm2) imprinting techniques for high fidelity meso-patterning of different types of polymer films. Examples include soft solid polymer films and surfaces like cross-linked polydimethylsiloxane (PDMS) and polyacrylamide (PAA) based hydrogels, thermoplastics like polystyrene (PS), polymethylmethacrylate (PMMA) etc both on planar and curved surfaces. These techniques address two key issues in imprinting:

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