IEICE Electronics Express | |
Bypass anode lateral IGBT on SOI for snapback suppression | |
Zhaoji Li1  Bo Zhang1  Qiang Fu1  | |
[1] State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China | |
关键词: LIGBT; snapback effect; turnoff time; SOI; | |
DOI : 10.1587/elex.11.20140470 | |
学科分类:电子、光学、磁材料 | |
来源: Denshi Jouhou Tsuushin Gakkai | |
【 摘 要 】
References(10)In this letter a novel lateral insulated gate bipolar transistor with a three dimensional (3D) bypass anode design on silicon-on-insulator (SOI) is proposed and discussed. The 3D bypass anode concept makes it more effectively not only suppress the snapback effect in conducting state, but also improve the switching speed as a fast electron extraction path during turnoff without wasting the anode area. Numerical simulation results show that the proposed LIGBT structure has a 1.12 V forward voltage drop and 400 ns turnoff time at current density of 100 A/cm2. The proposed LIGBT saves the cell area by above 30% compared with the conventional no snapback SA-LIGBT and has about 61% reduction in turnoff time compared with the conventional LIGBT, respectively. Mostly, the proposed LIGBT can be fabricated by the conventional SOI smart power IC process without an additional process step and mask.
【 授权许可】
Unknown
【 预 览 】
Files | Size | Format | View |
---|---|---|---|
RO201911300339693ZK.pdf | 1037KB | download |