Digest Journal of Nanomaterials and Biostructures | |
EFFECT OF OXYGEN FLOW RATE ON STRUCTURAL AND OPTICALPROPERTIES OF SnO2 THIN FILMS PREPARED BY APCVD TECHNIQUE | |
A. M. Saleh1  | |
关键词: Tin oxide; Thin film; Optical properties; APCVD; XRD; FE-SEM; | |
DOI : | |
学科分类:生物技术 | |
来源: Institute of Materials Physics | |
【 摘 要 】
Thin films of tin oxide were deposited on glass substrates at temperature 400°C undervarious flow rates of oxygen using atmospheric pressure chemical vapor depositionmethod (APCVD). The synthesized thin films were characterized by X-Ray Diffraction(XRD), UV-VIS spectrophotometer and Field Emission Scanning Electron Microscopy(FE-SEM) to study the structural and optical properties. The results of X-ray diffractionshowed that the crystallite size in these thin films were varied as a result of varyingdeposition conditions, and the average crystalline size was found using Scherrer equationwhich showed decreasing with decreasing the flow rate within (4-8 NL/h). FE-SEMimages of the films showed that the particle size for two samples were 24.2 and 32.3 nmwhich corresponding to flow rates 4 and 5 NL/h respectively. The optical band gaps ofthe films were in the rang (3.72-4.1 eV).
【 授权许可】
Unknown
【 预 览 】
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RO201910283539128ZK.pdf | 848KB | download |