EFFECT OF OXYGEN FLOW RATE ON STRUCTURAL AND OPTICALPROPERTIES OF SnO2 THIN FILMS PREPARED BY APCVD TECHNIQUE

Digest Journal of Nanomaterials and Biostructures

A. M. Saleh¹ 

关键词: Tin oxide;    Thin film;    Optical properties;    APCVD;    XRD;    FE-SEM;   

DOI  :  

学科分类：生物技术

来源: Institute of Materials Physics

【 摘 要 】

Thin films of tin oxide were deposited on glass substrates at temperature 400°C undervarious flow rates of oxygen using atmospheric pressure chemical vapor depositionmethod (APCVD). The synthesized thin films were characterized by X-Ray Diffraction(XRD), UV-VIS spectrophotometer and Field Emission Scanning Electron Microscopy(FE-SEM) to study the structural and optical properties. The results of X-ray diffractionshowed that the crystallite size in these thin films were varied as a result of varyingdeposition conditions, and the average crystalline size was found using Scherrer equationwhich showed decreasing with decreasing the flow rate within (4-8 NL/h). FE-SEMimages of the films showed that the particle size for two samples were 24.2 and 32.3 nmwhich corresponding to flow rates 4 and 5 NL/h respectively. The optical band gaps ofthe films were in the rang (3.72-4.1 eV).

【 授权许可】

Unknown