IEICE Electronics Express | |
A novel high performance 3ÃVDD-tolerant ESD detection circuit in advanced CMOS process | |
Xi Li1  Houpeng Chen1  Jie Miao2  Yu Lei2  Xiaoyun Li3  Qian Wang3  Zhitang Song3  | |
[1] Shanghai Institute of Micro-system and Information Technology, Chinese Academy of Sciences;University of Chinese Academy of Sciences;State Key Laboratory of Functional Materials for Informatics | |
关键词: electrostatic discharge (ESD); mixed-voltage I/O; high trigger current; detection circuit; 28 nm HKMG CMOS process; | |
DOI : 10.1587/elex.14.20170899 | |
学科分类:电子、光学、磁材料 | |
来源: Denshi Jouhou Tsuushin Gakkai | |
【 摘 要 】
A novel high performance 3ÃVDD-tolerant electrostatic discharging (ESD) detection circuit using only 1ÃVDD devices was presented in a 28 nm 1.8 V high-k metal-gate (HKMG) CMOS technology. A sub-path and an enhanced path were adopted in this novel design to increase its trigger current. Two small-sized PMOS transistors were employed to protect this circuit out of gate-oxide reliability issues under normal operating conditions. And there is only one capacitor in our novel circuit to maintain a small layout area. Under the ESD stress events, spectre-simulation results show that the trigger current of our proposed circuit can reach 36.4 mA. And its leakage current is only 2.8 nA at 27°C, 243 nA at 120°C under normal operating conditions.
【 授权许可】
CC BY
【 预 览 】
Files | Size | Format | View |
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RO201902199831207ZK.pdf | 3667KB | download |