期刊论文详细信息
IEICE Electronics Express | |
Enhanced 3 Ã VDD-tolerant ESD clamp circuit with stacked configuration | |
Yu Lei1  Xi Li1  Xi Fan1  Zhen Tian1  Jiajun Hu1  Xiaoyun Li1  Houpeng Chen1  Qi Zhang1  Qian Wang1  Zhitang Song1  | |
[1] State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences | |
关键词: electrostatic discharge (ESD); power clamp; mixed-voltage I/O; high discharge current; SOI CMOS process; 28 nm high-k CMOS process; | |
DOI : 10.1587/elex.14.20160901 | |
学科分类:电子、光学、磁材料 | |
来源: Denshi Jouhou Tsuushin Gakkai | |
【 摘 要 】
An enhanced 3 à VDD-tolerant ESD clamp circuit with stacked configuration was presented.Four transistors were added in this design to transfer bias voltages or ESD voltages. This circuit was simulated in 0.18 µm silicon-on-insulator (SOI) CMOS process and 28 nm HKMG CMOS technology. Spectre-simulation results showed that the ESD discharge current is increased by 2 times and the discharge current is decreased to nA magnitudes compared to the conventional circuit.
【 授权许可】
CC BY
【 预 览 】
Files | Size | Format | View |
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RO201902191078918ZK.pdf | 2382KB | download |