期刊论文详细信息
IEICE Electronics Express
Enhanced 3 × VDD-tolerant ESD clamp circuit with stacked configuration
Yu Lei1  Xi Li1  Xi Fan1  Zhen Tian1  Jiajun Hu1  Xiaoyun Li1  Houpeng Chen1  Qi Zhang1  Qian Wang1  Zhitang Song1 
[1] State Key Laboratory of Functional Materials for Informatics (Shanghai Institute of Microsystem and Information Technology), Chinese Academy of Sciences
关键词: electrostatic discharge (ESD);    power clamp;    mixed-voltage I/O;    high discharge current;    SOI CMOS process;    28 nm high-k CMOS process;   
DOI  :  10.1587/elex.14.20160901
学科分类:电子、光学、磁材料
来源: Denshi Jouhou Tsuushin Gakkai
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【 摘 要 】

An enhanced 3 × VDD-tolerant ESD clamp circuit with stacked configuration was presented.Four transistors were added in this design to transfer bias voltages or ESD voltages. This circuit was simulated in 0.18 µm silicon-on-insulator (SOI) CMOS process and 28 nm HKMG CMOS technology. Spectre-simulation results showed that the ESD discharge current is increased by 2 times and the discharge current is decreased to nA magnitudes compared to the conventional circuit.

【 授权许可】

CC BY   

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