Plasma Assisted Chemical Vapour Deposition – Technological Design Of Functional Coatings

Archives of Metallurgy and Materials

S. Jonas¹  A. Małek¹  M. Januś¹  K. Kyzioł¹  S. Kluska¹  J. Konefał-Góral¹ 

[1] AGH UNIVERSITY OF SCIENCE AND TECHNOLOGY, AL. A. MICKIEWICZA 30, 30-059 KRAKÓW, POLAND

关键词: Keywords: PA CVD;    titanium;    aluminum alloys;    polyetheretherketone;    ceramic coatings;   

DOI  :  10.1515/amm-2015-0228

学科分类：金属与冶金

来源: Akademia Gorniczo-Hutnicza im. Stanislawa Staszica / University of Mining and Metallurgy

【 摘 要 】

Plasma Assisted Chemical Vapour Deposition (PA CVD) method allows to deposit of homogeneous, well-adhesive coatings at lower temperature on different substrates. Plasmochemical treatment significantly impacts on physicochemical parameters of modified surfaces. In this study we present the overview of the possibilities of plasma processes for the deposition of diamond-like carbon coatings doped Si and/or N atoms on the Ti Grade2, aluminum-zinc alloy and polyetherketone substrate. Depending on the type of modified substrate had improved the corrosion properties including biocompatibility of titanium surface, increase of surface hardness with deposition of good adhesion and fine-grained coatings (in the case of Al-Zn alloy) and improving of the wear resistance (in the case of PEEK substrate).

【 授权许可】

Unknown