Deposition of metal chalcogenide thin films by successive ionic layer adsorption and reaction (SILAR) method

Bulletin of Materials Science

关键词: Metal chalcogenides;    thin solid films;    SILAR method.;   

学科分类：材料工程

来源: Indian Academy of Sciences

【 摘 要 】

During last three decades, successive ionic layer adsorption and reaction (SILAR) method, has emerged as one of the solution methods to deposit a variety of compound materials in thin film form. The SILAR method is inexpensive, simple and convenient for large area deposition. A variety of substrates such as insulators, semiconductors, metals and temperature sensitive substrates (like polyester) can be used since the deposition is carried out at or near to room temperature. As a low temperature process, it also avoids oxidation and corrosion of the substrate. The prime requisite for obtaining good quality thin film is the optimization of preparative provisos viz. concentration of the precursors, nature of complexing agent, pH of the precursor solutions and adsorption, reaction and rinsing time durations etc.

【 授权许可】

CC BY