System for deposition of diamond like a-C:H films in Ar-C2H2 plasma with ion beam assistance

25th International Conference on Vacuum Technique and Technology

Lopatin, I.V.^1 ; Akhmadeev, Yu. H.^1 ; Yu Ignatov, D.^1 ; Kovalskiy, S.S.^1 ; Petrikova, E.A.^1

Institute of High Current Electronics, Siberian Branch, Russian Academy of Sciences (IHCE SB RAS), Tomsk

634055, Russia^1

关键词: a-C:H films;    Diamond-like;    Discharge voltages;    Gas plasma;    Ion charge;    Ion energies;    Plasma electrons;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/387/1/012047/pdf
DOI  :  10.1088/1757-899X/387/1/012047

来源: IOP

【 摘 要 】

The paper presents a system which comprises a gas plasma source and an ion source and allows surface treatment of dielectrics due to ion charge compensation by plasma electrons. The ion energy corresponds to the discharge voltage of the ion source. The hardness of a-C:H coatings deposited by the method is up to 40-45 GPa.