Properties of hydrogenated amorphous carbon films deposited by PECVD and modified by SF6 plasma

SURFACE & COATINGS TECHNOLOGY

卷:206

Article

Marins, N. M. S.¹  Mota, R. P.¹  Honda, R. Y.¹  Nascente, P. A. P.³  Kayama, M. E.¹  Kostov, K. G.¹  Algatti, M. A.¹  Cruz, N. C.²  Rangel, E. C.² 

[1] Univ Estadual Paulista, Lab Plasmas, Dept Quim & Fis, BR-12516410 Guaratingueta, SP, Brazil

[2] Univ Estadual Paulista, Lab Plasma Tecnol, BR-18087180 Sorocaba, SP, Brazil

[3] Univ Fed Sao Carlos, Dept Mat Engn, BR-13565905 Sao Carlos, SP, Brazil

关键词: Sulfur hexafluoride plasma treatment;    RF-PECVD;    a-C:H films;    Wettability;    Roughness;    Chemical composition;   

DOI  :  10.1016/j.surfcoat.2011.06.058

来源: Elsevier

【 摘 要 】

Hydrogenated amorphous carbon (a-C:H) films were grown at room temperature on glass and polished silicon substrates using RF-PECVD (Radio-Frequency Plasma Enhanced Chemical Vapor Deposition). Plasmas composed by 30% of acetylene and 70% of argon were excited by the application of RF signal to the sample holder with power ranging from 5 to 125W. After deposition, the films were submitted to SF6-plasma treatment for 5 minutes. SF6 plasmas were generated at a pressure of 13.3 Pa by a RF power supply operating at 13.56 MHz with the output fixed at 70 W. The resulting films were characterized in terms of their molecular structure, chemical composition, surface morphology, thickness, contact angle, and surface free energy. During the SF6 plasma treatment, fluorine species were incorporated in the film structure causing chemical alterations. The interaction of chemical species generated in the SF6 plasmas with surface species was responsible for the decrease of the film thickness and surface energy, and for the increase of the film roughness and hydrophobicity. Published by Elsevier B.V.

【 授权许可】

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