Preparation of Vanadium Oxide Thin Films under Different Annealing Conditions

4th Annual International Workshop on Materials Science and Engineering

He, Changan^1 ; Wang, Qingguo^1 ; Qu, Zhaoming^1

Key Laboratory on Electromagnetic Environment Simulation and Protection, Army Engineering University, Shijiazhuang

050003, China^1

关键词: Al2O3 ceramics;    Annealing condition;    Experimental requirements;    High temperature;    Process parameters;    Vacuum-annealing;    Vanadium oxide thin films;    VO2 thin film;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/381/1/012127/pdf
DOI  :  10.1088/1757-899X/381/1/012127

来源: IOP

【 摘 要 】

A novel method was used to fabricate VXOY thin films by combining magnetron sputtering and vacuum annealing processes on Al2O3 ceramic substrates, which greatly improved the success rate of the experiments and reduced the experimental requirements for the instruments. The substrate was magnetron sputter coated further oxidized in a tube furnace to produce a uniform V2O5 surface, then annealed at high temperatures. XRD and SEM measurements were performed on the obtained films under different annealing conditions. Characterization results of the samples indicate that the highly reproducible VO2 thin films can be achieved by controlling the process parameters of the magnetron sputtering and vacuum annealing. The experimental results are of great guidance value in VO2 thin film preparation.