LEAF ECR Ion Source Control System

4th Annual International Workshop on Materials Science and Engineering

Liu, Xiaojun^1,2 ; Zhang, Wei^1 ; An, Shi^1,2 ; Guo, Yuhui^1 ; Chang, Jianjun^1,2 ; Wang, Pengpeng^1 ; Liu, Yuting^1,2 ; Zhao, Hongwei^1 ; Sun, Liangting^1 ; Wu, Junqi^1 ; Chen, Yun^1

Institute of Modern Physics, Chinese Academy of Sciences, 509 Nanchang RD, Lanzhou

730000, China^1

University of Chinese Academy of Sciences, No.19 (A) Yuquan RD., Beijing

100049, China^2

关键词: Charge state;    Control device;    ECR ion source;    Interlock systems;    Operator interfaces;    Performance testing;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/381/1/012182/pdf
DOI  :  10.1088/1757-899X/381/1/012182

来源: IOP

【 摘 要 】

FECR ion source is replaced with LAPECR ion source temporarily for other components performance testing in LEAF. LAPECR ion source can afford intense low charge state or medium charge state ion beams. This paper introduces the control system which comprises software, hardware and the interlock system. The control system is based on EPICS and the device supports are developed in Linux. CSS is utilized as the Operator Interface. Commercial controllers and PLCs are adopted to control devices, acquire experimental data and create interlock system. At present, LAPECR ion source has provided beam (150 μA, 4H1+, 0.5Mev) for RFQ outlet. This control system can work stable and interlock system can effectively protect equipment from damage.