Study on Oxidation Resistance of TiAlN Films Deposited by Magnetron Sputtering

2nd International Conference on Materials Engineering and Nano Sciences

材料科学;物理学

Huo, Hongying^1 ; Zou, Min^2

State Key Laboratory for Vanadium and Titanium Testing, Panzhihua University, Panzhihua, China^1

College of Material Engineering, Panzhihua University, Panzhihua, China^2

关键词: Hard alloy;    Hard thin films;    Phase analysis;    Substrate films;    TiAlN film;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/378/1/012014/pdf
DOI  :  10.1088/1757-899X/378/1/012014

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

In this paper, TiAlN hard thin film is deposited on hard alloy surface by magnetron sputtering; at 400 °C to 825 °C, oxidation experiment is performed for the samples; XRD is used for phase analysis of TiAlN hard thin film; Through the use of HVS-1000 digital micro-hardness tester and WS-2004 automatic scratching tester, microhardness of the samples and substrate-film adherence are analyzed. Results show: the microhardness and coherence of TiAlN thin film reduces with the rise of temperature; at 800 °C, the microhardness and substrate-film adherence remain at 1603 HV and 48 N respectively; it is found through comprehensive judgment that TiAlN thin film can work under 800 °C.